Share
ion implantation: equipment and techniques: proceedings of the fourth international conference berchtesgaden, fed. rep. of germany, september 13 17, 1
H. Ryssel
(Illustrated by)
·
H. Glawischnig
(Illustrated by)
·
Springer
· Paperback
ion implantation: equipment and techniques: proceedings of the fourth international conference berchtesgaden, fed. rep. of germany, september 13 17, 1 - Ryssel, H. ; Glawischnig, H.
Choose the list to add your product or create one New List
✓ Product added successfully to the Wishlist.
Go to My Wishlists
Origin: U.S.A.
(Import costs included in the price)
It will be shipped from our warehouse between
Thursday, June 06 and
Monday, June 24.
You will receive it anywhere in United Kingdom between 1 and 3 business days after shipment.
Synopsis "ion implantation: equipment and techniques: proceedings of the fourth international conference berchtesgaden, fed. rep. of germany, september 13 17, 1"
The Fourth International Conference on Ion Implantation: Equipment and Tech- niques was held at the Convention Center in Berchtesgaden, Bavaria, Germany, from September 13 to 17, 1982. It was attended by more than 200 participants from over 20 different countries. Severa1 series of conferences have dealt with the app1ication of ion implantation to semiconductors and other materials (Thousand Oaks, 1970; Garmisch-Partenkirchen, 1971; Osaka, 1974; Warwick, 1975; Bou1der, 1975; Budapest, 1978; and Albany, 1980). Another series of conferences has been devoted to implantation equipment and techniques (S- ford, 1977; Trento, 1978; and Kingston, 1980). This conference was the fourth in the 1atter series. Twe1ve invited papers and 55 contributed papers covered the areas of ion implantation equipment, measuring techniques, and app1ica- tions of implantation to metals and semiconductors. A schoo1 on ion implantation was held in connection with the conference, and the 1ectures presented at this schoo1 were pub1ished as Vo1. 10 of the Springer Series in E1ectrophysics under the tit1e Ion Implantation Techniques (edited by H. Rysse1 and H. G1awischnig). During the conference, space was also provided for presentations and demonstrations by manufacturers of ion implantation equipment. Once again, this conference provided a forum for free discussion among implantation specia1ists in industry as we11 as research institutions. Espe- cially effective in stimulating a free exchange of information was the daily get-together over free beer at the "Bier Adam". Many people contributed to the success of this conference.
